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Institute for Photonics and Nanotechnologie; CNR - Consiglio Nazionale delle Ricerche Laboratorio LNESS, Politecnico di Milano, Italy
Monica Bollani, (female) is a researcher of the Photonic and Nanotechnology Institute (IFN)-CNR in LNESS laboratory (Como, Italy). She graduated in chemistry, in 1997 at the Milano University (Italy), on self-assembled organic monolayer systems. She obtained a European PhD in November 2000 in materials physics from the University of Aix-Marseille (France), concerning microscopic and spectroscopic analysis of silicon sensors. She moved to a research post-doc position targeting the SiGe epitaxial growth at the ETH in Zurich (CH). In December 2004 she became a researcher at the IFN-CNR in Italy (Como) working in the optical and electron-beam lithography group in L-NESS, mainly dedicated to nanostructurization of low-dimensional semiconductor systems. She has a broad and multi-disciplinary education integrated by an extended experience in sensors fabrication, in photonics and plasmonic, project management and lab and clean room operations.
To date she has 66 published articles and a chapter of a book.
Title of ICPAM talk: Design, characterization and lithographic application of Si nanocrystals patterns via templated dewetting